论文标题

缺陷工程和Fermi级调整半程拓扑半学

Defect engineering and Fermi-level tuning in half-Heusler topological semimetals

论文作者

Khalid, Shoaib, Inbar, Hadass S., Chatterjee, Shouvik, Palmstrom, Christopher J., Janotti, Bharat Medasani Anderson

论文摘要

三维拓扑半学拥有与带交叉相关的一系列有趣的量子现象,这些现象会导致狄拉克(Dirac)或韦尔(Weyl Fermions),并且可以潜在地设计为新型的量子设备。收获这些材料的全部潜力将取决于我们将费米水平定位在对称性保护带交叉附近的能力,从而使它们的异国情调旋转和电荷传输特性在设备中变得突出。最近对拓扑半身师的散装和薄膜进行的实验表明,费米水平远离对称性保护的交叉,导致在观察拓扑受保护的表面状态时,散装带的强烈干扰。使用密度函数理论计算,我们探讨了如何使用固有缺陷来调整两个代表性的半手拓扑半学ptlusb和ptlubi中的费米水平。我们的结果解释了HALL和角度分辨光发射测量结果的最新结果。计算表明,PT空缺是在典型生长条件下生长的这些材料中最丰富的内在缺陷,并且这些缺陷导致过量的孔密度,使费米水平显着低于原始材料中预期的位置。通过调整化学电位调节费米水平的方向。

Three-dimensional topological semimetals host a range of interesting quantum phenomena related to band crossing that give rise to Dirac or Weyl fermions, and can be potentially engineered into novel quantum devices. Harvesting the full potential of these materials will depend on our ability to position the Fermi level near the symmetry-protected band crossings so that their exotic spin and charge transport properties become prominent in the devices. Recent experiments on bulk and thin films of topological half-Heuslers show that the Fermi level is far from the symmetry-protected crossings, leading to strong interference from bulk bands in the observation of topologically protected surface states. Using density functional theory calculations we explore how intrinsic defects can be used to tune the Fermi level in the two representative half-Heusler topological semimetals PtLuSb and PtLuBi. Our results explain recent results of Hall and angle-resolved photoemission measurements. The calculations show that Pt vacancies are the most abundant intrinsic defects in these materials grown under typical growth conditions, and that these defects lead to excess hole densities that place the Fermi level significantly below the expected position in the pristine material. Directions for tuning the Fermi level by tuning chemical potentials are addressed.

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