学术文献库

Localized residual stress and elastic strain concentrations in microelectronic devices often affect the electronic performance, resistance to thermomechanical damage, and, likely, radiation tolerance. A primary challenge for characterization of these concentrations is that they exist over sub-$μ$m length-scales, precluding their characterization by more traditional residual stress measurement techniques. Here we demonstrate the use of synchrotron X-ray -based differential aperture X-ray microscopy (DAXM) as a viable, non-destructive means to characterize these stress and strain concentrations in a depth-resolved manner. DAXM is used to map two-dimensional strain fields between source and drain in a gallium nitride (GaN) layer within high electron mobility transistors (HEMTs) with sub-$μ$m spatial resolution. Strain fields at various positions in both pristine and irradiated HEMT specimens are presented in addition to a preliminary stress analysis to estimate the distribution of various stress components within the GaN layer. $γ$-irradiation is found to significantly reduce the lattice plane spacing in the GaN along the sample normal direction which is attributed to radiation damage in transistor components bonded to the GaN during irradiation.