论文标题
使用可变电子束注入的质子束的等离子体尾矿中的映射电荷捕获和加速度
Mapping charge capture and acceleration in a plasma wakefield of a proton bunch using variable emittance electron beam injection
论文作者
论文摘要
在清醒第一次实验运行的第2阶段(从2018年5月到11月),电子束在rubidium等离子体柱中使用电子束探测和测试质子驱动的Wakefield加速度。在这项工作中,我们分析了具有各种电子束注入参数的质子驱动的等离子体韦克菲尔德加速器的整体电荷捕获和射击重现性。证人电子束是使用配备有CS2TE光学电极的RF-gun生产的,该光电被可调整的超快深紫外线(UV)激光脉冲照明。紫外光束光学系统的构造实现了其脉冲持续时间,大小和光电阴极上位置的适当横向光束,以及相对于电离激光脉冲的时间延迟,该激光脉冲在质子束中播种了血浆Wakefields。可变光电电极照明提供了所需的灵活性,以产生具有可变电荷,发射率和注入轨迹的电子束进入等离子体柱。我们在优化的电子注入条件下展示了超过15%的电荷捕获率(385 PC注入电子束的GEV加速电荷)。
In the Phase 2 of the AWAKE first experimental run (from May to November 2018), an electron beam was used to probe and test proton-driven wakefield acceleration in a rubidium plasma column. In this work, we analyze the overall charge capture and shot-to-shot reproducibility of the proton-driven plasma wakefield accelerator with various electron bunch injection parameters. The witness electron bunches were produced using an RF-gun equipped with a Cs2Te photocathode illuminated by a tailorable ultrafast deep ultraviolet (UV) laser pulse. The construction of the UV beam optical system enabled appropriate transverse beam shaping and control of its pulse duration, size, and position on the photocathode, as well as time delay with respect to the ionizing laser pulse that seeds the plasma wakefields in the proton bunches. Variable photocathode illumination provided the required flexibility to produce electron bunches with variable charge, emittance, and injection trajectory into the plasma column. We demonstrate charge capture rates exceeding 15% (40 pC of GeV accelerated charge for a 385 pC injected electron bunch) under optimized electron injection conditions.