论文标题
通过反射差分干涉显微镜的表面表征的次纳米表表征准确性
Subnanometer Accuracy of Surface Characterization by Reflected-Light Differential Interference Microscopy
论文作者
论文摘要
通过考虑光学衍射效果，我们通过反射的不连贯差分干扰显微镜来理论表面表征。随着定位分析的整合，我们开发了一个定量差分干扰光学系统，通过该系统，我们证明了测量表面高度变化的轴向分辨率对两个空间分化的梁之间的剪切距离敏感。我们通过光刻构造了三个纳米大小的步骤，并以0.13 nm Hz^（-1/2）轴向精度成功地表征了其1D高度变化。我们的结果表明，光学差异干扰显微镜可用于以下表面结构的实时表征，具有亚纳光度的精度和较大的视野，这对微/纳米电力学系统的表面表征非常有益。
We theorize the surface step characterization by reflected incoherent-light differential interference microscopy with consideration of the optical diffraction effect. With the integration of localization analysis, we develop a quantitative differential interference optical system, by which we demonstrate that the axial resolution of measuring surface height variation is sensitive to the shear distance between the two spatially differentiated beams. We fabricate three nanometer-size steps by photolithography, and successfully characterize their 1D height variations with 0.13 nm Hz^(-1/2) axial precision. Our result suggests that the optical differential interference microscopy can be used for real-time characterization of surface structure with a subnanometer accuracy and a large field of view, which is greatly beneficial to the surface characterization of micro/nano-electromechanical systems.
