论文标题
二维组IV-V化合物中的全区域持续旋转纹理具有巨大的自旋分裂
Full-zone Persistent Spin Textures with Giant Spin Splitting in Two-dimensional Group IV-V Compounds
论文作者
论文摘要
持续的自旋纹理(PST)是在动量$ k $ -space中维持单向旋转极化的固态材料的特性,提供了一条路线,可以通过持续的旋转螺旋(PSH)机制提供必要的长载载型寿命。但是,大多数发现的PST本地发生在第一个Brillouin区域(FBZ)的某些高对称性$ K $点或线周围的小部分中,因此限制了PSH状态的稳定性。在此,通过对称分析和第一原则计算,我们报告了全区PST(FZPST)的出现,该现象在整个FBZ中显示了PST,在二维IV-V $ a_ {2} B_ {2} B_ {2} B_ {2} b_ {2} $($ a $ a $ = si,sn $ = si,sn,ge; $ b $ $ $ b $ $ $ $ $ $ $ $ $ $ = bi)中。由于在整个FBZ中的任意$ \ vec {k} $的波矢量点组对称性中存在平面镜像对称操作,因此在$ k $ - 空间中观察到完全不合格的自旋极化,从而维护FZPST。重要的是,我们观察到PST维持的巨型自旋分裂,支持PSH状态的大型SOC参数和小波长。我们的$ \ vec {k} \ cdot \ vec {p} $分析表明,FZPST对非脱位频段是可靠的,可以通过应用外部电场的应用有效控制,从而为未来的旋转器应用提供了有前途的平台。
Persistent spin texture (PST), a property of solid-state materials maintaining unidirectional spin polarization in the momentum $k$-space, offers a route to deliver the necessary long carrier spin lifetimes through the persistent spin helix (PSH) mechanism. However, most of the discovered PST locally occurred in the small part around certain high symmetry $k$-points or lines in the first Brillouin zone (FBZ), thus limiting the stability of the PSH state. Herein, by symmetry analysis and first-principles calculations, we report the emergence of full-zone PST (FZPST), a phenomenon displaying the PST in the whole FBZ, in the two-dimensional group IV-V $A_{2}B_{2}$ ($A$ = Si, Sn, Ge; $B$ = Bi, Sb) compounds. Due to the existence of the in-plane mirror symmetry operation in the wave vector point group symmetry for the arbitrary $\vec{k}$ in the whole FBZ, fully out-of-plane spin polarization is observed in the $k$-space, thus maintaining the FZPST. Importantly, we observed giant spin splitting in which the PST sustains, supporting large SOC parameters and small wavelengths of the PSH states. Our $\vec{k}\cdot\vec{p}$ analysis demonstrated that the FZPST is robust for the non-degenerate bands, which can be effectively controlled by the application of an external electric field, thus offering a promising platform for future spintronic applications.