论文标题
1-和2- $ $ M $ M波长激光生产的微螺旋细胞血浆的表征,用于产生极端粉状光
Characterization of 1- and 2-$μ$m-wavelength laser-produced microdroplet-tin plasma for generating extreme-ultraviolet light
论文作者
论文摘要
在5.5--25.5nm的极端粉状物(EUV)波长范围内,介绍了实验光谱研究,这些光范围是由5-ns-pulsed,2- $ $ $ $ M-M-Wavelength Laser Laster辐射产生的血浆发出的光。将发射光谱与从1- $ $ M波长ND驱动的等离子体获得的发射光谱进行比较:在一系列激光强度范围内,横跨约$ 0.3-5 \ times 10^{11} $ WCM $^{ - 2} $的发射光谱。在这一范围的驱动激光强度范围内,我们发现,当保持比率为1- $ m $ m至2- $ m $ m $ m m的激光强度时,可以获得相似的光谱和基础等离子电荷状态分布,这与Ralef-2D-2D辐射 - 辐射 - 辐射 - 透明型 - 透明动力学模拟都符合2.1(6)的固定。在模拟的支持下,我们的实验发现表明,相关等离子体电子密度的$ \simλ^{ - 1} $近似成反比,以及上述所需的驱动激光强度,具有驱动激光波长$λ$。该缩放还扩展到光学深度,该光谱在光谱的观察到的变化中,范围为16-51 $ $ m的一系列液滴直径,其持续的激光强度以恒定的激光强度,可在13.5nm的2 \%带宽中最大化13.5nm左右的发射,相对于总光谱,带宽相关,带有eiv litage的带量。 2- $μ$ m- vs 1- $ $ m $ m驱动的等离子体的光谱性能的显着改善为开发高功率,高能量近红外激光器的发展提供了强大的动力,以使EUV光的更有效,强大的EUV光源开发。
Experimental spectroscopic studies are presented, in a 5.5--25.5nm extreme-ultraviolet (EUV) wavelength range, of the light emitted from plasma produced by the irradiation of tin microdroplets by 5-ns-pulsed, 2-$μ$m-wavelength laser light. Emission spectra are compared to those obtained from plasma driven by 1-$μ$m-wavelength Nd:YAG laser light over a range of laser intensities spanning approximately $0.3-5 \times 10^{11}$Wcm$^{-2}$, under otherwise identical conditions. Over this range of drive laser intensities, we find that similar spectra and underlying plasma charge state distributions are obtained when keeping the ratio of 1-$μ$m to 2-$μ$m laser intensities fixed at a value of 2.1(6), which is in good agreement with RALEF-2D radiation-hydrodynamic simulations. Our experimental findings, supported by the simulations, indicate an approximately inversely proportional scaling $\sim λ^{-1}$ of the relevant plasma electron density, and of the aforementioned required drive laser intensities, with drive laser wavelength $λ$. This scaling also extends to the optical depth that is captured in the observed changes in spectra over a range of droplet diameters spanning 16-51$μ$m at a constant laser intensity that maximizes the emission in a 2\% bandwidth around 13.5nm relative to the total spectral energy, the bandwidth relevant for EUV lithography. The significant improvement of the spectral performance of the 2-$μ$m- vs 1-$μ$m driven plasma provides strong motivation for the development of high-power, high-energy near-infrared lasers to enable the development of more efficient and powerful sources of EUV light.