论文标题
SN-NB复合氧化物中的特征晶体结构得出的位点选择性氧空位形成
Site-Selective Oxygen Vacancy Formation Derived from the Characteristic Crystal Structures of in Sn-Nb complex Oxides
论文作者
论文摘要
二价锡氧化物作为新型的P型氧化物半导体引起了很大的关注,这对于实现未来的氧化物电子设备至关重要。最近,开发了P型SN2NB2O7和SNNB2O6。但是,实际使用需要减少缺陷浓度来增强孔迁移率。在这项工作中,我们研究了可能降低孔产生效率和孔迁移率的氧空位形成与SN-NB复合氧化物中的晶体结构之间的相关性。 X射线衍射的扩展X射线吸收光谱和RIETVELD分析表明,在两个锡niobates中与SN离子键合的O位点上的氧空位的优先形成。此外,在p型SN2NB2O7中发现了SN离子周围的大量氧空位,从而表明氧空位对低孔产量效率的影响。氧空位对晶体结构的依赖性可以从根据键价和Debye温度评估的SN-O键强度阐明。两个SN-NB复合氧化物的键强度的差异通过SN2+的空间障碍与不对称电子密度分布相关。这表明材料设计的重要性着重于SN离子周围的局部结构,以防止在P型SN2+氧化物中形成氧空位。
Divalent tin oxides have attracted considerable attention as novel p-type oxide semiconductors, which are essential for realizing future oxide electronic devices. Recently, p-type Sn2Nb2O7 and SnNb2O6 were developed; however, enhanced hole mobility by reducing defect concentrations is required for practical use. In this work, we investigate the correlation between the formation of oxygen vacancy which may reduce the hole-generation efficiency and hole mobility, and the crystal structure in Sn-Nb complex oxides. Extended X-ray absorption fine structure spectroscopy and Rietveld analysis of x-ray diffraction revealed the preferential formation of oxygen vacancy at the O site bonded to the Sn ions in both the tin niobates. Moreover, a large amount of oxygen vacancy around the Sn ions were found in the p-type Sn2Nb2O7, thereby indicating the effect of oxygen vacancy to the low hole-generation efficiency. The dependence of the formation of oxygen vacancy on the crystal structure can be elucidated from the Sn-O bond strength that is evaluated based on the bond valence sum and Debye temperature. The differences in the bond strengths of the two Sn-Nb complex oxides are correlated through the steric hindrance of Sn2+ with asymmetric electron density distribution. This suggests the importance of the material design with a focus on the local structure around the Sn ions to prevent the formation of oxygen vacancy in p-type Sn2+ oxides.