论文标题
三组分的磁杂质
Magnetic impurity in a triple-component semimetal
论文作者
论文摘要
我们研究了磁性杂质在多型触摸费米子系统中的影响，特别是具有平坦条带的三组分半分量的半分量，可以在过渡金属硅化硅（COSI家族）中实现。当化学势与平坦条带重合时，预计该系统的杂质响应将与普通的狄拉克或韦伊尔半分析的杂质响应大不相同，而普通的dirac或weyl semital的杂质响应在费米级的状态密度消失。我们首先确定平均场近似值内的相图。然后，我们通过采用两种不同的方法来研究当地力矩制度。在低温方向上，通过变异波函数方法分析了围质筛查，并获得了对磁化敏感性和热容量的杂质贡献，而在较高温度下，我们使用运动方法方程来计算杂质位点的职业数量和杂质磁性敏感性。比较结果并与通常的费米液体和Dirac/Weyl半法中的结果进行了比较。
We investigate the effects of a magnetic impurity in a multiband touching fermion system, specifically, a triple-component semimetal with a flat band, which can be realized in a family of transition metal silicides (CoSi family). When the chemical potential coincides with the flat band, it is expected that the impurity response of this system will be very different from that of an ordinary Dirac or Weyl semimetal of which the density of states at the Fermi level vanishes. We first determine the phase diagram within the mean-field approximation. Then, we study the local moment regime by employing two different methods. In the low temperature regime, the Kondo screening is analyzed by the variational wavefunction approach and the impurity contributions to the magnetic susceptibility and heat capacity are obtained, while at higher temperature, we use the equation of motion approach to calculate the occupation number of the impurity site and the impurity magnetic susceptibility. The results are compared and contrasted with those in the usual Fermi liquid and the Dirac/Weyl semimetals.
