论文标题

欧洲专利局(EPO)专利网络的全球化出现

Globalization emergence in the European Patent Office (EPO) patent network

论文作者

Tsouchnika, Maria, Smolyak, Alex, Argyrakis, Panos, Havlin, Shlomo

论文摘要

我们研究了欧洲专利局(EPO)专利申请人合作网络的发展,该网络在35年的数据范围内(1978-2013)。在整个数据时间表中分布在许多时间范围内的巨型组件(GC)编队过程中,我们发现管理这种现象的功能表明申请人合作中的全球化。时间表似乎分为三个制度,对应于网络发展的三个状态。在早期的状态下,GC需要很长时间才形成,并且很容易确定其创建的瞬间,而它具有具有技术相似活动的地理隔离申请人组。相比之下,在较晚的状态下,GC很快形成,其创建的确切点很难发现,申请人的活动在技术上更加不同,而区域间协作则大大增加。中年是早期和末期两个极端之间的中间状态。此外,我们得出的结论是,诱发GC编队的关键专利通常是由大型申请人引入的,而且最高专利的申请人可能会提交关键专利,尽管其速度低于其整体专利提交的速度。最后,我们揭示了日本在网络连贯性中所扮演的关键作用,其主要参与GC和关键专利。

We studied the evolution of the European Patent Office (EPO) patents applicants' collaborations network, within a 35 years span of data (1978-2013). Focusing on the Giant Component (GC) formation process over many time-windows, distributed throughout the data timeline, we found that the features governing this phenomenon are indicative of emerging globalization in the applicants' collaborations. The timeline appears to be divided into three regimes, corresponding to three states of the network's evolution. In the early years state, the GC takes long to form and the instant of its creation is easily pinpointed, while it features geographically segregated groups of applicants with technologically similar activities. In contrast, in the late years state, the GC forms quickly, the exact point of its creation is harder to spot, the applicants' activities are more disparate technologically, while their inter-regional collaborations are significantly increased. The middle years are an intermediate state between the two extreme of early and late years. Moreover, we concluded that the critical patents, which induce the GC's formation, are typically introduced by large-sized applicants and also that top patent-producing applicants are likely to submit critical patents, albeit at a lower rate than their overall patent submission. Lastly, we uncovered the crucial role that Japan plays in the network's coherence, through its prominent participation in the GC and the critical patents.

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