论文标题
通过同轴弧等离子体制造的半导体超晶钻石/氢化的无定形碳复合薄膜的硼掺杂作用:X射线吸收光谱研究
Boron-Doping Effects on Local Structures of Semiconducting Ultrananocrystalline Diamond/Hydrogenated Amorphous Carbon Composite Thin Films Fabricated via Coaxial Arc Plasma: an X-ray Absorption Spectroscopic Study
论文作者
论文摘要
通过同轴弧等离子体合成的超晶型钻石/氢化的无定形碳复合薄膜具有明显的结构性特征,这些结构特征是嵌入无定形碳和氢化的无定形碳基质中的钻石晶粒的结构特征,是该膜最大的组成部分。由于无定形性质产生了更大的光吸收系数以及带有紫外线射线的光诱导载体的产生来源,因此这些薄膜可能是深伏脉光电探测器应用的潜在候选者。从以前的一些研究中,在实验条件下掺杂硼已经实现了膜的P型传导。此外,先前研究了它们的光学和电特性。但是,尚未研究很大程度上影响设备物理特性的粘结结构。在这项工作中,进行了近乎边缘的吸收精细结构光谱表征。结果表明,粘结状态σ* c-b优先形成,结构失真是在硼掺杂的早期阶段引起的。进一步掺入膜可减少不饱和键的量,例如π* c = -c,这可能是设备性能降解的原因。我们的工作提出了一种对薄膜局部结构的硼掺杂作用的基本案例模型。
Ultrananocrystalline diamond/hydrogenated amorphous carbon composite thin films synthesized via coaxial arc plasma possess a marked structural feature of diamond grains embedded in an amorphous carbon and a hydrogenated amorphous carbon matrix which are the largest constituents of the films. Since the amorphous nature yields much larger light absorption coefficients as well as a generation source of photo-induced carriers with UV rays, these films can be potential candidates for deep-UV photodetector applications. From some previous studies p-type conduction of the films has been realized by doping boron in experimental conditions. In addition, their optical and electrical characteristics were investigated previously. However, the bonding structures which largely affect the physical properties of the devices have not been investigated. In this work, near-edge X-ray absorption fine structure spectroscopy characterizations are carried out. The result reveals that a bonding state σ* C-B of diamond surfaces is formed preferentially and structural distortion is caused at an early stage of boron-doping. Further doping into the films lessens the amount of unsaturated bonds such as π* C=-C, which may be a cause of the device performance degradations. Our work suggests a fundamental case model of boron-doping effects on a local structure of the film.