论文标题
原子薄磁性半导体CRPS4的光化学和光热氧化之间的跨界
Crossover between Photochemical and Photothermal Oxidations of Atomically Thin Magnetic Semiconductor CrPS4
论文作者
论文摘要
许多由过渡金属二进制代表代表的二维(2D)半导体在可见的或接近IR范围内具有可调的光带镜,作为光电设备的有前途的候选者。但是,尽管有这种潜力,但在机械细节中,它们的光反应并未得到充分理解或有争议。在这项工作中,我们报告了独特的厚度依赖性光电反应敏感性,并且在硫代磷酸铬(CRPS4)(二维抗抗铁磁半导体)中的两个相互竞争的反应机制之间进行切换。 CRPS4显示出比MOS2遵守光热反应途径的阈值功率密度2个数量级。此外,用拉曼光谱量量化的反应横截面揭示了低功率和高功率状态的独特功率依赖性。根据原位原位温度测量和针对O2,水和光子能量的控制实验,我们提出了一种光化学氧化机制,该机制涉及低功率状态的单线O2,其另一个具有光热路线。我们还证明了与AL2O3的高效封装,以防止破坏性的光诱导和环境氧化。
Many two-dimensional (2D) semiconductors represented by transition metal dichalcogenides have tunable optical bandgaps in the visible or near IR-range standing as a promising candidate for optoelectronic devices. Despite this potential, however, their photoreactions are not well understood or controversial in the mechanistic details. In this work, we report a unique thickness-dependent photoreaction sensitivity and a switchover between two competing reaction mechanisms in atomically thin chromium thiophosphate (CrPS4), a two-dimensional antiferromagnetic semiconductor. CrPS4 showed a threshold power density 2 orders of magnitude smaller than that for MoS2 obeying a photothermal reaction route. In addition, reaction cross section quantified with Raman spectroscopy revealed distinctive power dependences in the low and high power regimes. On the basis of optical in situ thermometric measurements and control experiments against O2, water, and photon energy, we proposed a photochemical oxidation mechanism involving singlet O2 in the low power regime with a photothermal route for the other. We also demonstrated a highly effective encapsulation with Al2O3 as a protection against the destructive photoinduced and ambient oxidations.