论文标题
通过电化学蚀刻来制造钨纳米探针：阴极几何形状的作用及其用作电探针
Fabrication of Tungsten nanoprobes by Electrochemical etching: Role of cathode geometry and their use as electrical probe
论文作者
论文摘要
纳米级设备和结构的电测量需要技能和硬件来制作纳米接触。由于探针站和纳米探针的成本，对于实验室的数量很难进行此类测量。在目前的工作中，我们证明了使用USB显微镜（30美元）和内部开发的探针站组装低成本探测站的可能性。我们已经探索了蚀刻电极形状对开发的微探针几何形状的影响。观察到铜线电极几何形状的变化会影响探针长度（0.58 mm至2.15 mm）及其半锥角（1.4至8.8度）。这些开发的探针用于在微型图案金属膜上接触，并与半导体参数分析仪一起用于电测量。这些探针显示出低接触性（4欧姆），并遵循欧姆行为。这些探针可用于参与教学和多学科研究活动和原子力显微镜的实验室。
Electrical measurement of nano-scale devices and structures requires skills and hardware to make nano-contacts. Such measurements have been difficult for number of laboratories due to cost of probe station and nano-probes. In the present work, we have demonstrated possibility of assembling low cost probe station using USB microscope (US $ 30) coupled with in-house developed probe station. We have explored the effect of shape of etching electrodes on the geometry of the microprobes developed. The variation in the geometry of copper wire electrode is observed to affect the probe length (0.58 mm to 2.15 mm) and its half cone angle (1.4 to 8.8 degree). These developed probes were used to make contact on micro patterned metal films and was used for electrical measurement along with semiconductor parameter analyzer. These probes show low contact resistance ( 4 ohm) and follows ohmic behavior. Such probes can be used for laboratories involved in teaching and multidisciplinary research activities and Atomic Force Microscopy.
