论文标题
正常金属粒子陷阱的接近效应的作用
Role of the proximity effect for normal-metal quasiparticle traps
论文作者
论文摘要
在超导部分中存在非平衡的准粒子的情况下，许多超导装置的性能被降解。疏散其撤离的一种有希望的方法是使用正常的金属粒子陷阱，在该陷阱中，正常金属与超导体的金属接触良好。配备了这种陷阱的电压偏置的正常水平 - 绝缘体 - 螺旋体连接器用于研究诱捕性能以及其中超导接近效应的作用。这涉及一个适当的一维连接模型以及描述超导体非平衡状态的USADEL方程的数值解。陷阱的功能取决于隧道屏障处的状态密度（DOS）。在此，接近效应会导致两个影响捕获性能的拮抗特征：在能量$ | e |的DOS的有益降低。 =δ_ {\ text {bcs}} $与光谱能隙的收缩，导致准粒子中毒。对于这两种效果，陷阱位置都是决定性的，需要考虑到优化陷阱性能。另外，研究了超导部分内部耗散正常与超电流之间的转化，并研究了其对准粒子密度的影响。
The performance of many superconducting devices is degraded in presence of non-equilibrium quasiparticles in the superconducting part. One promising approach towards their evacuation is the use of normal-metal quasiparticle traps, where normal metal is brought into good metallic contact with the superconductor. A voltage biased normal-metal--insulator--superconductor junction equipped with such a trap is used to investigate on the trapping performance and the part played by the superconducting proximity effect therein. This involves an appropriate one-dimensional model of the junction and the numerical solution of Usadel equations describing the non-equilibrium state of the superconductor. The functionality of the trap is determined by the density of states (DOS) at the tunnel barrier. Herein, the proximity effect leads to two antagonistic characteristics affecting the trapping performance: the beneficial reduction of the DOS at an energy $|E| = Δ_{\text{BCS}}$ versus the contraction of the spectral energy gap causing quasiparticle poisoning. For both effects the trap position is decisive, which needs to be taken into account for optimizing the trapping performance. In addition, the conversion between dissipative normal and supercurrent inside the superconducting part with its impact on the quasiparticle density is studied.
