论文标题

在退火合成 - 有限磁多层中增强的全光开关和域壁速度

Enhanced all-optical switching and domain wall velocity in annealed synthetic-ferrimagnetic multilayers

论文作者

Wang, Luding, van Hees, Youri L. W., Lavrijsen, Reinoud, Zhao, Weisheng, Koopmans, Bert

论文摘要

合成铁磁PT/CO/GD堆栈中磁化的所有光学开关(AOS)由于其与磁性隧道连接(MTJ)等自旋设备的高潜力,以启用超快存储器应用,因此引起了极大的兴趣。禁令是MTJ制造中的一个必不可少的过程,以获得优化的隧道磁路术(TMR)比。但是,通过将AOS与前景中的MTJ整合在一起,尚未系统地研究PT/CO/GD堆栈中对单脉冲AOS和域壁(DW)动力学的退火效应。在这项研究中,我们通过实验探索对PT/CO/GD堆栈中田间诱导的DW运动的退火效果。结果表明,随着退火温度(T_A)的函数,AOS的阈值通量(F_0)显着降低,范围从100c到300c。具体而言,在300C退火时可以观察到F_0的28%降低,这是MTJ制造的关键T_A。最后,我们还证明了退火后蠕变状态中DW速度的显着增加,这归因于退火诱导的CO/GD界面互换。我们的发现表明,退火的PT/CO/GD系统促进了超快和节能的AOS,以及增强的DW速度,该速度非常适合光旋旋转的内存应用。

All optical switching (AOS) of the magnetization in synthetic ferrimagnetic Pt/Co/Gd stacks has received considerable interest due to its high potential towards integration with spintronic devices, such as magnetic tunnel junctions (MTJs), to enable ultrafast memory applications. Post-annealing is an essential process in the MTJ fabrication to obtain optimized tunnel magnetoresistance (TMR) ratio. However, with integrating AOS with an MTJ in prospect, the annealing effects on single-pulse AOS and domain wall (DW) dynamics in the Pt/Co/Gd stacks haven't been systematically investigated yet. In this study, we experimentally explore the annealing effect on AOS and field-induced DW motion in Pt/Co/Gd stacks. The results show that the threshold fluence (F_0) for AOS is reduced significantly as a function of annealing temperature (T_a) ranging from 100C to 300C. Specifically, a 28% reduction of F_0 can be observed upon annealing at 300C, which is a critical T_a for MTJ fabrication. Lastly, we also demonstrate a significant increase of the DW velocity in the creep regime upon annealing, which is attributed to annealing-induced Co/Gd interface intermixing. Our findings show that annealed Pt/Co/Gd system facilitates ultrafast and energy-efficient AOS, as well as enhanced DW velocity, which is highly suitable towards opto-spintronic memory applications.

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