论文标题
使用总反射镜的X射线自由电子激光器的纳米焦点光学元件产生100 ew/cm $^2 $的极端强度
Nanofocusing optics for an X-ray free-electron laser generating an extreme intensity of 100 EW/cm$^2$ using total reflection mirrors
论文作者
论文摘要
使用总反射镜，使用X射线自由电子激光器（XFEL）的纳米焦点光系统用于X射线自由电子激光（XFEL），以生成极高的强度为100 ew/cm $^2 $（10 $^2 $^2 $^2 $^0 $ w/cm $^2 $）使用总反射镜。该系统基于Kirkpatrick-baez几何形状，其长250毫米椭圆形的镜子为Spring-8 Angstrom紧凑型自由电子激光（SACLA）XFEL XFEL设施进行了优化。所用的纳米精确表面涂有若会，在总反射条件下，高反射率为80％，光子能量高达12 keV。光学上的事件X射线反映出超过900 $ $ m的大型空间接受。聚焦梁为210 nm $ \ times $ 120 nm（最大宽度的全宽度），并以10 keV的光子能进行评估。为$ \ textit {100 exa} $开发的光学元件有效地达到了1 $ \ times $ 10 $^2 $^2 $^2 $^0 $ w/cm $^2 $，脉冲持续时间为7 fs，脉冲能量为150 $μ$ J（在光源中生成的脉冲能量的25％）。可以提供各种阶段布置和样本条件的实验室，包括真空环境和大气压力氦气，并设置了焦点光学器件以满足实验要求。
A nanofocusing optical system referred to as $\textit{100 exa}$ for an X-ray free-electron laser (XFEL) was developed to generate an extremely high intensity of 100 EW/cm$^2$ (10$^2$$^0$ W/cm$^2$) using total reflection mirrors. The system is based on Kirkpatrick-Baez geometry, with 250 mm long elliptically figured mirrors optimized for the SPring-8 Angstrom Compact Free-Electron Laser (SACLA) XFEL facility. The nano-precision surface employed is coated with rhodium and offers a high reflectivity of 80%, with a photon energy of up to 12 keV, under total reflection conditions. Incident X-rays on the optics are reflected with a large spatial acceptance of over 900 $μ$m. The focused beam is 210 nm $\times$ 120 nm (full width at half maximum) and was evaluated at a photon energy of 10 keV. The optics developed for $\textit{100 exa}$ efficiently achieved an intensity of 1 $\times$ 10$^2$$^0$ W/cm$^2$ with a pulse duration of 7 fs and a pulse energy of 150 $μ$J (25% of the pulse energy generated at the light source). The experimental chamber, which can provide varied stage arrangements and sample conditions, including vacuum environments and atmospheric pressure helium, was set up with the focusing optics to meet the experimental requirements.
