论文标题
实验性观察表明HFTE5上边缘状态的拓扑性质
Experimental observations indicating the topological nature of the edge states on HfTe5
论文作者
论文摘要
二维拓扑绝缘子的拓扑边缘状态具有较大的能隙,提供了理想的传导通道,用于无耗散电流运输。从理论上讲,过渡金属Tellurides Xte5(X = ZR,HF)被预测为大间隙二维拓扑作用器,并且已经报道了其大量绝缘间隙和间隙边缘状态的实验性观察,但这些边缘状态的拓扑性质仍然尚待进一步阐明。在这里,我们报告了HFTE5单晶的低温扫描隧道显微镜/光谱研究。我们在HFTE5的表面单层上的费米水平附近显示了约80 meV的完整能隙,并且在单层步进边缘测量时,这种绝缘能隙会填充有限的能量状态。值得注意的是,这种状态在宽度宽的单单元狭窄单层带的边缘不存在,但在单位宽宽的单层凹槽的两个步骤边缘都持续存在。这些实验观察结果强烈表明,HFTE5单层的边缘状态并非由翻译对称性破裂引起,而是受到2D非平凡散装特性保护的拓扑。
The topological edge states of two-dimensional topological insulators with large energy gap furnish ideal conduction channels for dissipationless current transport. Transition metal tellurides XTe5 (X=Zr, Hf) are theoretically predicted to be large-gap two-dimensional topological insulators and the experimental observations of their bulk insulating gap and in-gap edge states have been reported, but the topological nature of these edge states still remains to be further elucidated. Here, we report our low temperature scanning tunneling microscopy/spectroscopy study on single crystals of HfTe5. We demonstrate a full energy gap of ~80 meV near the Fermi level on the surface monolayer of HfTe5 and that such insulating energy gap gets filled with finite energy states when measured at the monolayer step edges. Remarkably, such states are absent at the edges of a narrow monolayer strip of one-unit-cell in width but persist at both step edges of a unit-cell wide monolayer groove. These experimental observations strongly indicate that the edge states of HfTe5 monolayers are not trivially caused by translational symmetry breaking, instead they are topological in nature protected by the 2D nontrivial bulk properties.