论文标题
大区域2D晶体的通用机械去角质
Universal mechanical exfoliation of large-area 2D crystals
论文作者
论文摘要
Two-dimensional (2D) materials provide extraordinary opportunities for exploring phenomena arising in atomically thin crystals.从石墨烯的第一个隔离开始，机械去角质一直是提供高质量2D材料的关键，但是尽管有所改善，其产量，横向尺寸和污染仍然有限。在这里，我们引入了一种无污染的，一步和通用AU辅助的机械剥落方法，并通过隔离40种类型的单晶单层（包括元素2D晶体，金属 - 二甲化剂，磁体，磁铁和超导体）来证明其有效性。它们中的大多数是毫米大小和高质量的，如电子显微镜，照相光谱和电运输的无传递测量所示。 Large suspended 2D crystals and heterojunctions were also prepared with high-yield.晶体和底物之间的粘附增强可以使这种有效的去角质化，为此，我们确定了一个共同的规则，该规则是生产大面积单层的普遍途径，因此支持对基本特性的研究以及2D材料的潜在应用。
Two-dimensional (2D) materials provide extraordinary opportunities for exploring phenomena arising in atomically thin crystals. Beginning with the first isolation of graphene, mechanical exfoliation has been a key to provide high-quality 2D materials but despite improvements it is still limited in yield, lateral size and contamination. Here we introduce a contamination-free, one-step and universal Au-assisted mechanical exfoliation method and demonstrate its effectiveness by isolating 40 types of single-crystalline monolayers, including elemental 2D crystals, metal-dichalcogenides, magnets and superconductors. Most of them are of millimeter-size and high-quality, as shown by transfer-free measurements of electron microscopy, photo spectroscopies and electrical transport. Large suspended 2D crystals and heterojunctions were also prepared with high-yield. Enhanced adhesion between the crystals and the substrates enables such efficient exfoliation, for which we identify a common rule that underpins a universal route for producing large-area monolayers and thus supports studies of fundamental properties and potential application of 2D materials.
